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Record Nr. |
UNINA9910816230703321 |
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Titolo |
Low temperature plasma technology : methods and applications / / edited by Paul K. Chu, XinPei Lu |
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Pubbl/distr/stampa |
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Boca Raton : , : CRC Press, , 2014 |
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ISBN |
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0-429-19397-1 |
1-4665-0991-0 |
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Edizione |
[1st ed.] |
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Descrizione fisica |
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1 online resource (488 p.) |
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Classificazione |
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SCI013050SCI055000TEC021000 |
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Altri autori (Persone) |
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Disciplina |
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Soggetti |
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Low temperature plasmas |
Low temperature plasmas - Industrial applications |
Low temperature plasmas - Scientific applications |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Description based upon print version of record. |
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Nota di bibliografia |
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Includes bibliographical references. |
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Nota di contenuto |
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section 1. Fundamentals -- section 2. Processing and characterization -- section 3. Applications. |
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Sommario/riassunto |
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This book provides a comprehensive overview of low temperature plasma generation, experimental methods, diagnostics, and novel applications. The first section describes basic principles of low temperature plasma physics. The second section discusses simulations of low temperature plasmas, the two main streams to generate atmospheric pressure non-equilibrium plasmas (microdischarge and nanosecond pulse discharge) and plasma diagnostics methods. The last section deals with the broad range of applications, from synthesis of nanomaterials and environmental applications to treatment of biomaterials and plasma medicine-- |
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