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Record Nr. |
UNINA9910786028203321 |
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Autore |
Marguí Eva |
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Titolo |
X-ray fluorescence spectrometry and related techniques : an introduction / / Eva Marguí, René van Grieken |
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Pubbl/distr/stampa |
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New York, New York : , : Momentum Press, , [2013] |
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©2013 |
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ISBN |
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1-283-99156-X |
1-60650-393-6 |
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Descrizione fisica |
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1 online resource (162 p.) |
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Disciplina |
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Soggetti |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Description based upon print version of record. |
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Nota di bibliografia |
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Includes bibliographical references and index. |
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Nota di contenuto |
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Preface -- Series preface -- Series editor -- About the authors -- |
1. Introduction -- 1.1 Basic principles of x-ray fluorescence -- 1.2 Interactions of x-rays with matter -- 1.3 X-ray safety and protection -- |
2. Basic components of x-ray fluorescence spectrometers -- 2.1 General introduction -- 2.2 Excitation sources -- 2.2.1 X-ray tubes -- 2.2.2 Radioisotopes -- 2.2.3 Other sources -- 2.3 Sample chamber -- 2.4 Detection system -- 2.4.1 Types of detectors -- 2.4.1.1 Gas-filled detectors -- 2.4.1.2 Scintillation detectors -- 2.4.1.3 Solid-state detectors -- 2.4.2 Resolution and efficiency -- 2.4.2.1 Resolution -- 2.4.2.2 Efficiency -- 2.4.3 Comparison of detection systems -- 2.4.4 Detector artifacts -- 2.4.4.1 Escape peaks -- 2.4.4.2 Sum peaks (pile-up effect) -- 2.4.5 Signal processing system -- 2.5 Source and detector modifiers -- 2.5.1 Filters -- 2.5.1.1 Primary filters -- 2.5.1.2 Detector filters -- 2.5.2 Secondary targets -- 2.5.3 Focusing optics -- 2.5.4 Dispersing systems -- 2.5.5 Collimators -- 2.5.6 Masks -- 2.6 Instrument configurations -- |
3. Qualitative and quantitative x-ray fluorescence analysis -- 3.1 Evaluation of x-ray fluorescence spectra -- 3.2 Qualitative XRF analysis -- 3.3 Quantitative XRF analysis -- 3.3.1 Chemical matrix effects -- 3.3.1.1 Absorption effects -- 3.3.1.2 Enhancement effects -- 3.3.2 Correction and compensation methods -- 3.3.2.1 Compensation methods -- 3.3.2.2 Matrix correction methods -- 3.3.2.3 Overview of |
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correction and compensation methods -- 3.3.3 Quality of XRF analytical results -- 3.3.3.1 Limits of detection (LOD) and quantification (LOQ) -- 3.3.3.2 Working range and linearity -- 3.3.3.3 Precision and accuracy -- 3.3.3.4 Quality control of the results -- |
4. Sample preparation procedures -- 4.1 Introduction -- 4.2 General sample preparation procedures -- 4.2.1 Solid samples -- 4.2.1.1 Direct XRF analysis -- 4.2.1.2 Powdered specimen -- 4.2.1.3 Fused specimen -- 4.2.1.4 Digested specimen -- 4.2.2 Liquid samples -- 4.2.2.1 Preconcentration methods -- 4.3 Specific sample preparation procedures -- |
5. Wavelength/energy dispersive x-ray fluorescence spectrometry (WDXRF/EDXRF) -- 5.1 Introduction and basic principles -- 5.2 WDXRF and EDXRF layouts -- 5.2.1 WDXRF instrumentation -- 5.2.2 EDXRF instrumentation -- 5.3 Comparison of WDXRF and EDXRF systems -- 5.4 Applications of WDXRF and case studies -- 5.4.1 Determination of metal residues in active pharmaceutical ingredients -- 5.4.2 Determination of heavy metal content in automotive -- shredder residues (ASR) -- 5.4.3 Metal determination in polluted soils and waters -- 5.5 Applications of EDXRF and case studies -- 5.5.1 Determination of heavy metals at trace levels in vegetation samples -- 5.5.2 Determination of Cu, Ni, Zn, Pb, and Cd in aqueous samples -- 5.5.3 Chemical characterization of aerosol samples -- |
6. Total Reflection X-Ray Spectrometry (TXRF) -- 6.1 Introduction and basic principles -- 6.2 TXRF layout -- 6.3 Analytical capabilities of TXRF systems -- 6.3.1 Chemical analysis -- 6.3.1.1 Sample carriers -- 6.3.1.2 Sample treatment procedures for chemical analysis by TXRF -- 6.3.1.3 Quantification -- 6.3.2 Surface analysis -- 6.4 Other applications of TXRF and case studies -- 6.4.1 Multielement determination in waste water effluents -- 6.4.2 Determination of trace amounts of Se in soil samples -- 6.4.3 Analysis of Si wafer surfaces -- |
7. Special XRF configurations and related techniques -- 7.1 Introduction -- 7.2 Microbeam X-ray fluorescence spectrometry ([mu]-XRF) -- 7.3 Synchrotron radiation-induced X-ray emission (SRXRF or SRIXE) -- 7.4 Particle-induced X-ray emission (PIXE) -- 7.5 Electron-induced X-ray emission -- 7.5.1 Scanning electron microscope (SEM) -- 7.5.2 Electron microprobe analysis (EMPA) -- |
8. Overview of XRF and related techniques -- 8.1 Introduction -- 8.2 Comparative performance of XRF systems -- 8.3 Role of XRF spectrometry in analysis field -- 8.4 Future perspectives -- |
Buyer's guide to manufacturers -- Glossary of abbreviations and acronyms -- References -- Bibliography -- Books and encyclopedia chapters -- Journals -- Index. |
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Sommario/riassunto |
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X-ray fluorescence spectrometry (XRF) is a well-established analytical technique for qualitative and quantitative elemental analysis of a wide variety of routine quality control and research samples. Among its many desirable features, it delivers true multi-element character analysis, acceptable speed and economy, easy of automation, and the capacity to analyze solid samples. This remarkable contribution to this field provides a comprehensive and up-to-date account of basic principles, recent developments, instrumentation, sample preparation procedures, and applications of XRF analysis. If you are a professional in materials science, analytic chemistry, or physics, you will benefit from not only the review of basics, but also the newly developed technologies with XRF. |
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