1.

Record Nr.

UNINA9910784745703321

Titolo

III-nitride [[electronic resource] ] : semiconductor materials / / editor, Zhe Chuan Feng

Pubbl/distr/stampa

London, : Imperial College Press, c2006

ISBN

1-281-86721-7

9786611867218

1-86094-903-7

Descrizione fisica

1 online resource (440 p.)

Altri autori (Persone)

FengZhe Chuan

Disciplina

541.377

541/.377

621.38152

Soggetti

Semiconductors - Materials

Nitrides

Lingua di pubblicazione

Inglese

Formato

Materiale a stampa

Livello bibliografico

Monografia

Note generali

Description based upon print version of record.

Nota di bibliografia

Includes bibliographical references.

Nota di contenuto

CONTENTS               ; Preface              ; Chapter 1 Hydride vapor phase epitaxy of group III nitride materials                                                                           ; 1.Introduction                     ; 2.Experiment                   ; 3.Material Properties                            ; 3.1. Undoped GaN layers                              ; 3.2. Si-doped GaN layers                               ; 3.3. Mg-doped GaN layers                               ; 3.4. Zn-doped GaN layers                               ; 3.5. AlN layers

3.6. AlGaN layers                        3.7. InN and InGaN layers                                ; 4.New directions in HVPE development                                           ; 4.1. Large area and multi wafer HVPE growth                                                  ; 4.2. Multi-layer structures                                  ; 4.3. P-n junctions                         ; 4.4. Structures with two dimensional carrier gas                                                       ; 4.5. Nano structures and porous materials

5.Applications of HVPE grown group III nitride materials                                                               5.1. Substrate applications                                  ; 5.1.1. Template substrates                                 ; 5.1.2. Free-standing substrates                                      ; 5.1.3. Bulk substrates                             ; 5.2. Device Applications                               ; 6.Conclusions



Chapter 2 Planar MOVPE technology for epitaxy of III-nitride materials                                                                             1. History of Reactor Development for III-Nitrides                                                         ; 2. Types of Planar Reactors                                  ; 3. Reactor Modeling                          ; 3.1. Growth Kinetics of Group-III Nitride MOVPE                                                      ; 3.2. Modeling of MOVPE processes

3.3. Horizontal Tube Reactors: Flow Dynamics and Reactor Technology                                                                          3.4. Planetary Reactors: Transport Phenomena & Parameter Dependencies                                                                            ; 4. In-situ Technology in Nitride MOCVD Systems                                                     ; 5. The Mass Production of GaN and Related Materials                                                          ; 5.1. Optoelectronic Device Structures

5.2. Growth in the 8x4 inch Configuration

Sommario/riassunto

III-Nitride semiconductor materials - (Al, In, Ga)N - are excellent wide band gap semiconductors very suitable for modern electronic and optoelectronic applications. Remarkable breakthroughs have been achieved recently, and current knowledge and data published have to be modified and upgraded. This book presents the new developments and achievements in the field.  Written by renowned experts, the review chapters in this book cover the most important topics and achievements in recent years, discuss progress made by different groups, and suggest future directions. Each chapter also describes th



2.

Record Nr.

UNINA9910254608303321

Autore

Friedrich Harald

Titolo

Scattering Theory / / by Harald Friedrich

Pubbl/distr/stampa

Berlin, Heidelberg : , : Springer Berlin Heidelberg : , : Imprint : Springer, , 2016

ISBN

3-662-48526-5

Edizione

[2nd ed. 2016.]

Descrizione fisica

1 online resource (293 p.)

Disciplina

530

Soggetti

Physics

Low temperatures

Atoms

Mathematical Methods in Physics

Low Temperature Physics

Atomic, Molecular, Optical and Plasma Physics

Lingua di pubblicazione

Inglese

Formato

Materiale a stampa

Livello bibliografico

Monografia

Note generali

Description based upon print version of record.

Nota di bibliografia

Includes bibliographical references at the end of each chapters and index.

Nota di contenuto

Classical Scattering Theory. -Elastic scattering by a conservative potential. – Internal excitation, Inelastic scattering. - Special topics -- Appendices -- Index.

Sommario/riassunto

This corrected and updated second edition of "Scattering Theory" presents a concise and modern coverage of the subject. In the present treatment, special attention is given to the role played by the long-range behaviour of the projectile-target interaction, and a theory is developed, which is well suited to describe near-threshold bound and continuum states in realistic binary systems such as diatomic molecules or molecular ions. It is motivated by the fact that experimental advances have shifted and broadened the scope of applications where concepts from scattering theory are used, e.g. to the field of ultracold atoms and molecules, which has been experiencing enormous growth in recent years, largely triggered by the successful realization of Bose-Einstein condensates of dilute atomic gases in 1995. The book contains sections on special topics such as near-threshold quantization, quantum reflection, Feshbach resonances and the quantum description



of scattering in two dimensions. The level of abstraction is kept as low as at all possible and deeper questions related to the mathematical foundations of scattering theory are passed by. It should be understandable for anyone with a basic knowledge of nonrelativistic quantum mechanics. The book is intended for advanced students and researchers, and it is hoped that it will be useful for theorists and experimentalists alike.