1.

Record Nr.

UNINA9910744501703321

Autore

Dryzek Jerzy

Titolo

Positron Profilometry : Probing Material Depths for Enhanced Understanding / / by Jerzy Dryzek

Pubbl/distr/stampa

Cham : , : Springer Nature Switzerland : , : Imprint : Springer, , 2023

ISBN

3-031-41093-9

Edizione

[1st ed. 2023.]

Descrizione fisica

1 online resource (146 pages)

Collana

SpringerBriefs in Materials, , 2192-1105

Disciplina

620.112

Soggetti

Materials - Analysis

Antimatter

Condensed matter

Building materials

Materials Characterization Technique

Matter-Antimatter Interactions

Condensed Matter Physics

Structural Materials

Lingua di pubblicazione

Inglese

Formato

Materiale a stampa

Livello bibliografico

Monografia

Nota di contenuto

Introduction -- Positron Annihilation Techniques -- Fate of Energetic Positrons in Matter -- Positron Implantation Profile -- Positron in Inhomogeneous Matter.

Sommario/riassunto

This book provides a comprehensive overview of positron profilometry, specifically focusing on the analysis of defect depth distribution in materials. Positron profilometry plays a crucial role in understanding and characterizing defects in a wide range of materials, including metals, semiconductors, polymers, and ceramics. By analyzing the depth distribution of defects, researchers can gain insights into various material properties, such as crystal structure, defect density, and diffusion behavior. The author's extensive research spanning a period of two decades has primarily centered on subsurface zones. These regions, located beneath the surface and subjected to various surface processes, play a crucial role in generating defect distributions. Three experimental techniques and their data analysis are described in detail: a variable-energy positron beam (VEP) called sometimes a slow



positron beam, a technique called implantation profile depth scanning (DSIP), and a sequential etching (SET) technique. The usability of these techniques is illustrated by many examples of measurements by the author and others.