Standard reference materials : certification of a standard reference material for the determination of interstitial oxygen concentration in semiconductor silicon by infrared spectrophotometry / / Brian G. Rennex
Pubbl/distr/stampa
Gaithersburg, MD : , : U.S. Dept. of Commerce, National Institute of Standards and Technology, , 1994
Descrizione fisica
1 online resource
Collana
NIST special publication ; ; 260-121
Lingua di pubblicazione
Inglese
Formato
Materiale a stampa
Livello bibliografico
Monografia
Note generali
1994.
Contributed record: Metadata reviewed, not verified. Some fields updated by batch processes.