|
|
|
|
|
|
|
|
1. |
Record Nr. |
UNINA9910702307603321 |
|
|
Autore |
Semendy Fred |
|
|
Titolo |
Surface characteristics of etched and non-etched silicon germanium (SiGe)/Si graded structure with varying Ge concentration grown by ultra-high vacuum (UHV)/chemical vapor deposition (CVD) for optoelectronic and power conversion applications / / Fred Semendy [and three others] |
|
|
|
|
|
|
|
Pubbl/distr/stampa |
|
|
Adelphi, MD : , : Army Research Laboratory, , 2012 |
|
|
|
|
|
|
|
Descrizione fisica |
|
1 online resource (vi, 16 pages) : color illustrations |
|
|
|
|
|
|
Collana |
|
|
|
|
|
|
Soggetti |
|
Surfaces (Technology) - Analysis |
Chemical vapor deposition |
Optoelectronic devices |
|
|
|
|
|
|
|
|
Lingua di pubblicazione |
|
|
|
|
|
|
Formato |
Materiale a stampa |
|
|
|
|
|
Livello bibliografico |
Monografia |
|
|
|
|
|
Note generali |
|
Title from title screen (viewed on Jan. 17, 2013). |
"September 2012." |
|
|
|
|
|
|
|
|
Nota di bibliografia |
|
Includes bibliographical references (pages 11-12). |
|
|
|
|
|