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1. |
Record Nr. |
UNINA9910479982703321 |
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Autore |
Christian Aymar Jean |
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Titolo |
Open TV : Innovation beyond Hollywood and the Rise of Web Television / / Aymar Jean Christian |
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Pubbl/distr/stampa |
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New York, NY : , : New York University Press, , [2018] |
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©2018 |
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ISBN |
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Descrizione fisica |
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1 online resource (257 p.) |
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Collana |
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Postmillennial Pop ; ; 20 |
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Disciplina |
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Soggetti |
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Internet television - Production and direction |
Electronic books. |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Nota di bibliografia |
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Includes bibliographical references and index. |
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Nota di contenuto |
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Front matter -- Contents -- Acknowledgments -- Introduction -- 1. Developing Open TV -- 2. Open TV Production -- 3. Open TV Representation -- 4. Open TV Distribution -- 5. Scaling Open TV -- Epilogue -- Notes -- Index -- About the Author |
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Sommario/riassunto |
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How the internet transformed television Before HBO’s hit show Insecure, Issa Rae’s comedy about being a nerdy black woman debuted as a YouTube web series The Misadventures of Awkward Black Girl, her response to the absence of diverse black characters on the small screen. Broad City, a feminist sitcom now on Comedy Central, originated as a web series on YouTube, developed directly out of funny women Ilana Glazer and Abbi Jacobson’s real-life friendship. These unconventional stories took advantage of the freedom afforded outside the traditional television system: online. Open TV shows how we have left “the network era” far behind and entered the networked era, with the web opening up new possibilities for independent producers, entrepreneurs, and media audiences. Based on interviews with writers, producers, show-runners, and network executives, visits to festivals and award shows, and the experience of producing his own series, Aymar Jean Christian argues that the web brought innovation to television by opening up series development to new producers, fans, and sponsors that had previously been excluded. Online access to |
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distribution provides creative freedom for indie producers, allows for more diverse storytelling from marginalized communities, and introduces new ways of releasing and awarding shows. Open TV is essential reading for anyone interested in the changing environment of television and how the internet can inspire alternatives to what’s on TV tonight. |
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2. |
Record Nr. |
UNINA9911006688403321 |
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Titolo |
High density plasma sources : design, physics, and performance / / edited by Oleg A. Popov |
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Pubbl/distr/stampa |
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Park Ridge, N.J., : Noyes Publications, c1995 |
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ISBN |
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1-282-75508-0 |
9786612755088 |
1-282-25321-2 |
9786612253218 |
0-8155-1789-0 |
1-59124-063-8 |
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Descrizione fisica |
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1 online resource (467 p.) |
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Collana |
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Materials science and process technology series |
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Altri autori (Persone) |
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Disciplina |
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Soggetti |
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Plasma density |
Plasma generators |
High temperature plasmas |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Description based upon print version of record. |
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Nota di bibliografia |
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Includes bibliographical references and index. |
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Nota di contenuto |
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Front Cover; High Density Plasma Sources: Design, Physics and Performance; Copyright Page; Contents; Chapter 1 Helicon Plasma Sources; 1.0 INTRODUCTION; 2.0 SUMMARY OF THEORY; 3.0 EXPERIMENTAL TESTS OF THEORY; 4.0 DESIGN OF HELICON SOURCES; 5.0 HELICON REACTORS FOR ETCHING AND DEPOSITION; ACKNOWLEDGMENTS; REFERENCES; Chapter 2 Planar Inductive Sources; 1.0 INTRODUCTION; 2.0 OPERATION; 3.0 POWER COUPLING; 4.0 FACTORS AFFECTING PROCESSING OF SUBSTRATES; 5.0 ETCHING |
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APPLICATIONS OF PLANAR INDUCTIVELY COUPLED PLASMA SOURCES; REFERENCES |
Chapter 3 Electrostatically-Shielded Inductively-Coupled RF Plasma Sources1.0 INTRODUCTION; 2.0 SURVEY OF HIGH DENSITY PLASMA SOURCES; 3.0 ANATOMY OF AN INDUCTIVELY COUPLED PLASMA; 4.0 UNSHIELDED HELICAL PLASMA SOURCES; 5.0 ELECTROSTATIC SHIELDING; 6.0 ESRF PLASMA SOURCE APPLICATIONS; 7.0 CONCLUSIONS; REFERENCES; Chapter 4 Very High Frequency Capacitive Plasma Sources; 1.0 INTRODUCTION; 2.0 STRUCTURE OF HIGH FREQUENCY CAPACITIVE PLASMAS; 3.0 ENERGY TRANSFER; 4.0 VHF PLASMA PARAMETERS; 5.0 VHF PROCESSING RESULTS; 6.0 SUMMARY; ACKNOWLEDGMENTS; REFERENCES; Chapter 5 Surface Wave Plasma Sources |
1.0 INTRODUCTION2.0 SUMMARY OF THE MAIN PROPERTIES OF SW SUSTAINED PLASMA COLUMNS; 3.0 ESSENTIAL ELEMENTS AND GENERAL FEATURES OF SW PLASMA SOURCES; 4.0 A FAMILY OF EFFICIENT SW LAUNCHERS FOR SUSTAINING PLASMA COLUMNS; 5.0 TYPICAL EXPERIMENTAL ARRANGEMENTS; 6.0 CONCLUSION; ACKNOWLEDGMENTS; REFERENCES; Chapter 6 Microwave Plasma Disk Processing Machines; 1.0 INTRODUCTION; 2.0 HISTORICAL DEVELOPMENT OF HIGH-DENSITY MICROWAVE PLASMA SOURCES AT MICHIGAN STATE UNIVERSITY; 3.0 THE GENERIC MICROWAVE PLASMA PROCESSING MACHINE; 4.0 SPECIFIC EXAMPLES OF MICROWAVE PLASMA PROCESSING MACHINES |
5.0 MICROWAVE PLASMA MACHINE PROCESS VARIABLES, AND PERFORMANCE FIGURES OF MERIT6.0 MULTIPOLAR ECR REACTOR PERFORMANCE IN ARGON GAS; 7.0 ECR REACTOR DESIGN CONSIDERATIONS; 8.0 PROCESS APPLICATIONS; 9.0 DISCUSSION; ACKNOWLEDGMENTS; REFERENCES; Chapter 7 Electron Cyclotron Resonance Plasma Sources; 1.0 INTRODUCTION; 2.0 PRINCIPLES OF ECR SOURCE OPERATION; 3.0 SPECIAL ECR CONFIGURATIONS AND APPLICATIONS; 4.0 OPEN ISSUES FOR ECR SOURCES; 5.0 SUMMARY; ACKNOWLEDGMENTS; REFERENCES; Chapter 8 Distributed ECR Plasma Sources; 1.0 INTRODUCTION |
2.0 MULTIPOLAR MAGNETIC FIELD CONFINEMENT: FROM MULTIPOLAR DISCHARGES TO DECR PLASMAS3.0 PLASMA UNIFORMITY IN MULTIPOLAR DISCHARGES: THEORETICAL AND EXPERIMENTAL ASPECTS; 4.0 CONFINEMENT AND TRAPPING OF FAST ELECTRONS IN MULTIPOLAR MAGNETIC FIELDS; 5.0 DISTRIBUTED ELECTRON CYCLOTRON RESONANCE PLASMAS (DECR PLASMAS); 6.0 FROM DECR TO UNIFORM DECR (UDECR) PLASMAS; 7.0 PLASMA PROCESSING IN DECR PLASMAS; 8.0 CONCLUSION; REFERENCES; Index |
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Sommario/riassunto |
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This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and pr |
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