1.

Record Nr.

UNINA9910462831703321

Titolo

Diffusion and diffusional phase transformation in alloys : selected, peer-reviewed papers fom the 4th International Workshop "Diffusion and Diffusional Phase Transformations in Alloys", DIFTRANS-2007 : 16-21 July 2007, Sofoyivka (Uman'), Cherkasy region, Ukraine / / edited by D. Beke [and three others]

Pubbl/distr/stampa

Stafa-Zurich, Switzerland : , : Trans Tech Publications, , [2008]

©2008

ISBN

3-03813-204-7

Descrizione fisica

1 online resource (228 p.)

Collana

Diffusion and defect forum, , 1012-0386 ; ; v. 277

Altri autori (Persone)

BekeD. L (Dezs℗ʺo L.)

Disciplina

669/.9

Soggetti

Alloys

Diffusion

Phase transformations (Statistical physics)

Electronic books.

Lingua di pubblicazione

Inglese

Formato

Materiale a stampa

Livello bibliografico

Monografia

Note generali

Description based upon print version of record.

Nota di bibliografia

Includes bibliographical references and index.

Nota di contenuto

Diffusion and Diffusional Phase Transformations in Alloys; Committees, Organizers; Preface; Table of Contents; Section 1 - Diffusion and Reactions; Silicide Formation Reactions in a-Si/Co Multilayered Samples; Lateral Diffusion Spreading of Two Competitive Intermetallic Phases over Free Surface ; Theoretical Analysis and Atomistic Modelling of Diffusion and Stability of Pure Element Hollow Nanospheres and Nanotubes; Effect of Substrate Temperature on the Different Diffuseness of Subsequent Interfaces in Binary Multilayers

Modeling of Diffusion Saturation of (α + β) Titanium Alloys by Nitrogen in the Rarefied Medium Suppression Criterion of the Phase Growth Based on Extremal Principles of Nonequilibrium Thermodynamics ; Model of Lateral Growth Stage during Reactive Phase Formation; Coupling of Electromigration and Non-Equilibrium Vacancies in Reactive Phase Growth; Section 2 - Driven Systems; Mechano-Chemistry;  Interdiffusion in Solid Solutions; Models of Mutual Solubility Increasing under the Pulse Loading ; Cluster Dynamics Simulation of



Reactor Pressure Vessel Steels under Irradiation

The Ageing of Beryllium Bronze in the Pulse Magnetic FieldThe Influence of Ti and Zr on the Diffusion of Isotope 63Ni in the Iron Surface Layer at Electric-Spark Alloying in Carbon Containing Environment; Effect of an Impulse Loading on Localization of Diffusing Atoms in Metals; Section 3 - General Problems of Diffusion; Atomic Mechanism of Carbon Diffusion in Cementite; Extended 'Five-Stream' Model for Diffusion of Implanted Dopants in Silicon during Ultra-Shallow Junction Formation in VLSI Circuits; Atomic-Migration-Controlled Processes in Intermetallics

Dependence of Diffusion Paths on Thermodynamic Factors in Ternary Systems Simulation of Pressure Effects on Self-Diffusion in BCC Metals; The Effect of Point Defects Interaction on Hydrogen Atom Diffusion in FCC- and BCC-Metals ; Section 4 - Structural & Phase Transformations; Numerical Simulation of Precipitates Evolution in Iron-Based Alloys; The Analysis of the Selective Oxidation of Multicomponent Alloy; Complex Phase Behavior of Systems with Negative Curvature Potentials

3D Monte Carlo Simulation of Phase Separation Kinetics in a Binary Metallic Alloy with Vacancy Mediated Diffusion: Effect of Initial Supersaturation Size-Induced Freezing Effect in Monte-Carlo Simulations of Phase Separation Kinetics in Nanoparticles ; Diffusion during Powder Metallurgy Synthesis of Titanium Alloys; Composition Fluctuations in the Ostwald Ripening; Kinetic and Thermodynamic Precipitation Parameters of the Pb-Sn Solid Solutions ; Section 5 - Surface and Grain Boundary Diffusion

Surface Diffusion in Coadsorbed Layers with Different Mobilities of Adsorbates: (Li +Dy) on Mo(112) and (Li+Sr) on W(112)

Sommario/riassunto

Diffusion-controlled processes still remain the most important and interesting phenomena in materials science. Among the problems which are currently to the fore, are the synergy of diffusion and morphological evolution, the initial stages of solid-state reactions, the analysis of nano- materials and related phenomena, thermo- and electromigration, and the reliability of solder joints and interconnects in microelectronic devices. A number of challenging problems still remain within the ""classical"" areas of nucleation, reactive- and inter-diffusion, phase growth in multicomponent and binary s