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Record Nr. |
UNINA9910459972603321 |
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Titolo |
Ultra clean processing of semiconductor surfaces XII : selected, peer reviewed papers from the 12th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) September 21-24, 2014, Brussels, Belgium / / edited by Paul Mertens, Marc Meuris and Marc Heyns |
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Pubbl/distr/stampa |
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Pfaffikon, Switzerland : , : TTP, , 2014 |
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Enfield, New Hampshire : , : Trans Tech Publications Ltd, , [date of distribution not identified] |
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©2014 |
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ISBN |
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Descrizione fisica |
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1 online resource (331 p.) |
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Collana |
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Solid State Phenomena, , 1662-7799 ; ; Volume 219 |
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Disciplina |
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Soggetti |
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Semiconductors |
Electronic books. |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Description based upon print version of record. |
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Nota di bibliografia |
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Includes bibliographical references at the end of each chapters and index. |
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Nota di contenuto |
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Ultra Clean Processing of Semiconductor Surfaces XII; Preface, Committee and Acknowledgement; Table of Contents; Chapter 1: Cleaning for FEOL Applications; Necessity of Cleaning and its Application in Future Memory Devices; Removal of Interfacial Layer in HfO2 Gate Stack by Post-Gate Cleaning Using NF3/NH3 Dry Cleaning Technique; Catalyst Assisted Low Temperature Pre Epitaxial Cleaning for Si and SiGe Surfaces; HF-Last Wet Clean in Combination with a Low Temperature GeH4-Assisted HCl In Situ Clean Prior to Si0.8Ge0.2-on-Si Epitaxial Growth |
Retardation Phenomenon of Oxide Removal during the Formation of Dual Gate Oxide via PR-Mask Wet Etching Aluminum Reduction in SC1; Metal Removal Efficiency in Deep Submicron Trenches by Wet Chemicals; Impact of Surface Treatment of Si3N4 on Subsequent SiO2 Deposition; Operation of a New Electrolyzed Cell Using Boron Doped Diamond Electrodes ; Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area; InGaAs (110) Surface Cleaning Using Atomic |
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Hydrogen; Surface Chemistry of GaAs(100) and InAs(100) Etching with Tartaric Acid; Nanoscale Etching and Reoxidation of InAs |
Passivation of In Sb(100) with 1-Eicosanethiol Self-Assembled Monolayers Cross-Contamination Risk Evaluation during Fabrication of III-V Devices in a Silicon Processing Environment; Surface Cleaning of Graphene by CO2 Cluster; Chapter 3: Wet Etching for FEOL Applications; Process Control Challenges of Wet Etching Large MEMS Si Cavities; Wet Etch Rate Behavior of Poly-Si in TMAH Solution at Various Ambient Gas Conditions; Advanced Monitoring of TMAH Solution; Effect of Dissolved Oxygen for Advanced Wet Processing; Watermark Formation on Bare Silicon: Impact of Illumination and Substrate Doping |
Selective Nitride Etching with Phosphoric and Sulfuric Acid Mixtures Using a Single-Wafer Wet Processor Single Wafer Selective Silicon Nitride Removal with Phosphoric Acid and Steam; Pt Etching Method at Low Temperature Using Electrolyzed Sulfuric Acid Solution; Nickel Selective Etch for Contacts on Ge Based Devices; Chapter 4: Wet Processing of High Aspect Ratio Structures; Study of Wetting of Nanostructures Using Decoration by Etching; Impact of Electrostatic Effects on Wet Etching Phenomenon in Nanoscale Region; Freeze Drying of High Aspect Ratio Structures |
Chapter 5: Fluid Dynamics, Cleaning Mechanics Effect of DI-Water Dilution and Etchant Arm Movement on Spinning Type Wet Etch; Effect of Nozzle Distance and Fluid Flow Rate in Jet Spray Wafer Cleaning Process; Effects of Chamber Pressure on the Performance of CO2 Beam Cleaning; Physical Chemistry of Water Droplets in Wafer Cleaning with Low Water Use; Metal Etch in Advanced Immersion Tank with Precision Uniformity Using Agitation and Wafer Rotation; Novel Slurry Injection System for Improved Slurry Flow and Reduced Defects in CMP |
Effect of Viscoelasticity of PVA Brush on Friction during Post-CMP Cleaning: A Guideline for Nodule Configuration |
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Sommario/riassunto |
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Collection of selected, peer reviewed papers from the 12th InternationalSymposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 21-24, 2014, Brussels, Belgium. The 71 papers are grouped as follows: Chapter 1: Cleaning for FEOL Applications, Chapter 2: Cleaning for FEOL Applications: Beyond-Si Active Area, Chapter 3: Wet Etching for FEOL Applications, Chapter 4: Wet Processing of High Aspect Ratio Structures, Chapter 5: Fluid Dynamics, Cleaning Mechanics, Chapter 6: Photo Resist Performance and Rework, Chapter 7: Cleaning for BEOL Interconnect Applications, Chapter 8: C |
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2. |
Record Nr. |
UNINA9910792376203321 |
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Titolo |
German colonialism, visual culture, and modern memory / / edited by Volker M. Langbehn |
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Pubbl/distr/stampa |
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New York : , : Routledge, , 2010 |
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ISBN |
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1-135-15334-5 |
1-135-15335-3 |
1-282-57027-7 |
9786612570278 |
0-203-85690-2 |
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Descrizione fisica |
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1 online resource (329 p.) |
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Collana |
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Routledge studies in modern European history ; ; 13 |
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Altri autori (Persone) |
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LangbehnVolker Max <1959-> |
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Disciplina |
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Soggetti |
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Racism - Germany - History |
Racism - Africa - History |
Visual communication - Political aspects - Germany - History |
Imperialism - Social aspects - Germany - History |
Popular culture - Germany - History |
Collective memory - Germany - History |
Germany Colonies Africa History |
Africa Colonial influence |
Africa Race relations |
Germany Intellectual life |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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"Simultaneously published in the UK."--T.p. verso. |
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Nota di bibliografia |
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Includes bibliographical references and index. |
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Nota di contenuto |
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Book Cover; Title; Copyright; Contents; Figures; Acknowledgments; Introduction: Picturing Race: Visuality and German Colonialism; Part I German Colonialism, 1884-1919; 1 Advertising and the Optics of Colonial Power at the Fin de Siècle; 2 " . . . will try to send you the best views from here": Postcards from the Colonial War in Namibia (1904-1908); 3 Harmless Kolonialbiedermeier?: Colonial and Exotic Trading |
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Cards; 4 Cakewalking the Anarchy of Empire around 1900; 5 Satire Magazines and Racial Politics; 6 Demystifying Colonial Settlement: Building Handbooks for Settlers, 1904-1930* |
7 Patriotism, Spectacle, and Reverie: Colonialism in Early CinemaPart II German Postcolonialism, 1919-Present; 8 Persuasive Maps and a Suggestive Novel: Hans Grimm's Volk ohne Raum and German Cartography in Southwest Africa; 9 Colonial Disgust: The Colonial Master's Emotion of Superiority; 10 Weimar Revisions of Germany's Colonial Past: The Photomontages of Hannah Höch and László Moholy-Nagy; 11 The "Colonial Idea" in Weimar Cinema; 12 "The Black Jew": An Afterimage of German Colonialism; 13 Reenacting Colonialism: Germany and Its Former Colonies in Recent TV Productions |
14 Postcolonial Amnesia?: Taboo Memories and Kanaks with CamerasContributors; Index |
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Sommario/riassunto |
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There is no overarching master narrative in understanding the history of German colonialism, and over the past decade, the study of Germany's colonial past has experienced a dramatic transformation in its scope of inquiry. Influenced by new theoretical and methodological approaches to the study of race, nationalism, and globalization, these new studies initiate a process of reevaluating and redefining the parameters within which German Colonialism is understood. The role of visual materials, in particular, is ideal for exploring the porousness of disciplinary boundaries, though visual cultu |
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