1.

Record Nr.

UNINA9910457850803321

Titolo

Nanofabrication using focused ion and electron beams [[electronic resource] ] : principles and applications / / edited by Ivo Utke, Stanislav Moshkalev, Phillip Russell

Pubbl/distr/stampa

Oxford ; ; New York, : Oxford University Press, 2011

ISBN

1-280-59350-4

9786613623331

0-19-992099-0

Descrizione fisica

1 online resource (830 p.)

Collana

Nanomanufacturing series ; ; v. 1

Altri autori (Persone)

UtkeIvo

MoshkalevStanislav

RussellPhillip <1955->

Disciplina

620.1/15

Soggetti

Nanostructured materials

Nanotechnology

Electron beams - Industrial applications

Ion bombardment - Industrial applications

Electronic books.

Lingua di pubblicazione

Inglese

Formato

Materiale a stampa

Livello bibliografico

Monografia

Note generali

Description based upon print version of record.

Nota di contenuto

Cover; Contents; Foreword; Preface; Contributors; INTRODUCTION; I-1.The Historical Development of Electron Beam Induced Deposition and Etching: From Carbonaceous to Functional Materials; I-2. Historical Evolution of FIB Instrumentation and Technology: From Circuit Editing to Nanoprototyping; PART I: FUNDAMENTALS AND MODELS; 1.The Theory of Bright Field Electron and Field Ion Emission Sources; 2. How to Select Compounds for Focused Charged Particle Beam Assisted Etching and Deposition; 3. Gas Injection Systems for FEB and FIB Processing Theory and Experiment

4. Fundamentals of Interactions of Electrons with Molecules5. Simulation of Focused Ion Beam Milling; 6. FEB and FIB Continuum Models for One Adsorbate Species; 7. Continuum Modeling of Electron Beam Induced Processes; 8. Monte Carlo Method in FEBID Process Simulations; PART II: APPLICATIONS; 9. Focused Electron Beam Induced



Processing (FEBIP) for Industrial Applications; 10. Focused Ion Beam and DualBeamTMTechnology Applied to Nanoprototyping; 11. Review of FIB Tomography; 12. In situ Monitoring of Gas-Assisted Focused Ion Beam and Focused Electron Beam Induced Processing

13. Cluster Beam Deposition of Metal, Insulator, and Semiconductor Nanoparticles14. Electron- and Ion-Assisted Metal Deposition for the Fabrication of Nanodevices Based on Individual Nanowires; 15. Focused Ion Beam Fabrication of Carbon Nanotube and ZnO Nanodevices; 16. Focused Ion and Electron Beam Induced Deposition of Magnetic Nanostructures; 17. Metal Films and Nanowires Deposited by FIB and FEB for Nanofabrication and Nanocontacting; 18. FIB Etching for Photonic Device Applications; 19. FIB etching of InP for Rapid Prototyping of Photonic Crystals

20. Applications of FIB for Rapid Prototyping of Photonic Devices, Fabrication of Nanosieves, Nanowires, and Nanoantennas21. Focused Particle Beam Induced Deposition of Silicon Dioxide; 22. Growth and Characterization of FEB-Deposited Suspended Nanostructures; 23. Electrical Transport Properties of Metallic Nanowires and Nanoconstrictions Created with FIB; 24. Structure-Property Relationship of Electronic Transport in FEBID Structures; 25. Characterization and Modification of Nanostructured Carbon Materials Using FIB and FEB

26. Electron Beam Controlled Patterning of Molecular Layers: Functional Surfaces and Nanomembranes27. Nanofabrication Using Electron Beam Lithography Processes; PART III: PROSPECTIVES; F-1. Focused Beam Processing-New BeamTechnologies-New Challenges in Process Development and Nanofabrication; Index; A; B; C; D; E; F; G; H; I; J; K; L; M; N; O; P; Q; R; S; T; U; V; W; X; Y; Z

Sommario/riassunto

Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabr