1.

Record Nr.

UNINA9910450147803321

Titolo

GaN-based materials and devices [[electronic resource] ] : growth, fabrication, characterization and performance / / editors, M.S. Shur, R.F. Davis

Pubbl/distr/stampa

Singapore ; ; River Edge, N.J., : World Scientific, c2004

ISBN

1-281-34762-0

9786611347628

981-256-236-2

Edizione

[33th ed.]

Descrizione fisica

1 online resource (295 p.)

Collana

Selected topics in electronics and systems ; ; v. 33

Altri autori (Persone)

ShurMichael

DavisRobert F <1942-> (Robert Foster)

Disciplina

537.6223

621.38152

Soggetti

Gallium nitride

Semiconductors

Electronic books.

Lingua di pubblicazione

Inglese

Formato

Materiale a stampa

Livello bibliografico

Monografia

Note generali

Description based upon print version of record.

Nota di bibliografia

Includes bibliographical references.

Nota di contenuto

Preface; CONTENTS; Materials Properties of Nitrides. Summary; Kinetics, Microstructure and Strain in GaN Thin Films Grown Via Pendeo-Epitaxy; Strain of GaN Layers Grown Using 6H-SiC(0001) Substrates with Different Buffer Layers; Growth of Thick GaN Films and Seeds for Bulk Crystal Growth; Cracking of GaN Films; Direct Bonding of GaN and SiC;  A Novel Technique for Electronic Device Fabrication; Electronic Properties of GaN (0001) - Dielectronic Interfaces; Transport and Noise Properties; Quasi-Ballistic and Overshoot Transport in Group III-Nitrides; High Field Transport in AIN

Generation-Recombination Noise in GaN-Based DevicesInsulated Gate III-N Heterostructure Field-Effect Transistors; High Voltage AIGaN/GaN Heterojunction Transistors; Etched Aperture GaN CAVET Through Photoelectrochemical Wet Etching; n-AlGaAs/p-GaAs/n-GaN Heterojunction Bipolar Transistor: The First Transistor Formed Via Wafer Fusion

Sommario/riassunto

The unique materials properties of GaN-based semiconductors



havestimulated a great deal of interest in research and developmentregarding nitride materials growth and optoelectronic andnitride-based electronic devices.  High electron mobility andsaturation velocity, high sheet carrier concentration atheterojunction interfaces, high breakdown field, and low thermalimpedance of GaN-based films grown over SiC or bulk AlN substratesmake nitride-based electronic devices very promising.