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1. |
Record Nr. |
UNISA996212507403316 |
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Titolo |
Advances in chemical physics . Volume 131 [[electronic resource] /] / edited by Stuart A. Rice |
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Pubbl/distr/stampa |
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New York ; ; Chichester, : Wiley, 2005 |
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ISBN |
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1-280-27726-2 |
9786610277261 |
0-471-73946-4 |
0-471-73945-6 |
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Descrizione fisica |
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1 online resource (540 p.) |
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Collana |
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Advances in chemical physics ; ; v. 131 |
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Altri autori (Persone) |
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Disciplina |
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Soggetti |
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Chemistry, Physical and theoretical |
Chemistry |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Description based upon print version of record. |
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Nota di bibliografia |
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Includes bibliographical references and indexes. |
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Nota di contenuto |
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ADVANCES IN CHEMICAL PHYSICS VOLUME 131; CONTRIBUTORS; INTRODUCTION; CONTENTS; POLYELECTROLYTE DYNAMICS; HYDRODYNAMICS AND SLIP AT THE LIQUID-SOLID INTERFACE; STRUCTURE OF IONIC LIQUIDS AND IONIC LIQUID COMPOUNDS: ARE IONIC LIQUIDS GENUINE LIQUIDS IN THE CONVENTIONAL SENSE?; CHEMICAL REACTIONS AT VERY HIGH PRESSURE; CLASSICAL DESCRIPTION OF NONADIABATIC QUANTUM DYNAMICS; NON-BORN-OPPENHEIMER VARIATIONAL CALCULATIONS OF ATOMS AND MOLECULES WITH EXPLICITLY CORRELATED GAUSSIAN BASIS FUNCTIONS; AUTHOR INDEX; SUBJECT INDEX |
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Sommario/riassunto |
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This series provides the chemical physics field with a forum for critical, authoritative evaluations of advances in every area of the discipline. Volume 131 includes chapters on: Polyelectrolyte Dynamics; Hydrodynamics and Slip at the Liquid-Solid Interface; Structure of Ionic Liquids and Ionic Liquid Compounds: Are Ionic Liquids Genuine Liquids in the Conventional Sense?; Chemical Reactions at Very High Pressure; Classical Description of Nonadiabatic Quantum Dynamics; and Non- |
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Born Oppenheimer Variational Calculations of Atoms and Molecules with Explicitly Correlated Gaussian Basis Functions. |
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2. |
Record Nr. |
UNINA9910437802903321 |
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Autore |
Hofmann S (Siegfried) |
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Titolo |
Auger- and x-ray photoelectron spectroscopy in materials science : a user-oriented guide / / Siegfried Hofmann |
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Pubbl/distr/stampa |
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Berlin ; ; Heidelberg, : Springer, 2012 |
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ISBN |
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Edizione |
[1st ed. 2013.] |
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Descrizione fisica |
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1 online resource (543 p.) |
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Collana |
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Springer series in surface sciences ; ; 49 |
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Disciplina |
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Soggetti |
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X-ray photoelectron spectroscopy |
Auger effect |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Note generali |
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Description based upon print version of record. |
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Nota di bibliografia |
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Includes bibliographical references and index. |
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Nota di contenuto |
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Outline of the Technique/Brief Description -- Theoretical Background -- Instrumentation -- Practical Surface Analysis with AES -- Data Evaluation/Quantification -- Problem Solving with AES (Examples). |
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Sommario/riassunto |
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To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e. |
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g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented. . |
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