1.

Record Nr.

UNINA9910337875803321

Autore

Rebohle Lars

Titolo

Flash Lamp Annealing : From Basics to Applications / / by Lars Rebohle, Slawomir Prucnal, Denise Reichel

Pubbl/distr/stampa

Cham : , : Springer International Publishing : , : Imprint : Springer, , 2019

ISBN

3-030-23299-9

Edizione

[1st ed. 2019.]

Descrizione fisica

1 online resource (xviii, 288 pages)

Collana

Springer Series in Materials Science, , 0933-033X ; ; 288

Disciplina

621.38152

620.11

Soggetti

Semiconductors

Optical materials

Electronic materials

Manufactures

Lasers

Photonics

Microwaves

Optical engineering

Nanotechnology

Optical and Electronic Materials

Manufacturing, Machines, Tools, Processes

Optics, Lasers, Photonics, Optical Devices

Microwaves, RF and Optical Engineering

Nanotechnology and Microengineering

Lingua di pubblicazione

Inglese

Formato

Materiale a stampa

Livello bibliografico

Monografia

Nota di bibliografia

Includes bibliographical references and index.

Nota di contenuto

Introduction -- Technological background -- Basic components -- Flash lamps -- Process management and process control -- FLA assisted deposition -- Temperature -- Thermal budget -- Temperature measurements -- Temperature simulations -- FLA for semiconductors -- Defect engineering -- Doping -- Crystallization -- Semiconductor nanostructures -- Beyond semiconductors -- Transparent conducting oxides -- Metallic films -- High-k materials and dielectrics -- Flexible



substrates -- Outlook.

Sommario/riassunto

This book provides a comprehensive survey of the technology of flash lamp annealing (FLA) for thermal processing of semiconductors. It gives a detailed introduction to the FLA technology and its physical background. Advantages, drawbacks and process issues are addressed in detail and allow the reader to properly plan and perform their own thermal processing. Moreover, this books gives a broad overview of the applications of flash lamp annealing, including a comprehensive literature survey. Several case studies of simulated temperature profiles in real material systems give the reader the necessary insight into the underlying physics and simulations. This book is a valuable reference work for both novice and advanced users.