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Record Nr. |
UNINA9910139552903321 |
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Autore |
Van der Heide Paul <1962-> |
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Titolo |
X-ray photoelectron spectroscopy : an introduction to principles and practices / / Paul van der Heide |
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Pubbl/distr/stampa |
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Hoboken, N.J., : Wiley, c2012 |
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ISBN |
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1-283-33247-7 |
9786613332479 |
1-118-16290-0 |
1-118-16289-7 |
1-118-16292-7 |
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Descrizione fisica |
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1 online resource (262 p.) |
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Classificazione |
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Disciplina |
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Soggetti |
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X-ray photoelectron spectroscopy |
Spectrum analysis |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Nota di bibliografia |
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Includes bibliographical references and index. |
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Nota di contenuto |
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X-RAY PHOTOELECTRON SPECTROSCOPY: An Introduction to Principles and Practices; CONTENTS; FOREWORD; PREFACE; ACKNOWLEDGMENTS; LIST OF CONSTANTS; CHAPTER 1: INTRODUCTION; 1.1 SURFACE ANALYSIS; 1.2 XPS/ESCA FOR SURFACE ANALYSIS; 1.3 HISTORICAL PERSPECTIVE; 1.4 PHYSICAL BASIS OF XPS; 1.5 SENSITIVITY AND SPECIFICITY OF XPS; 1.6 SUMMARY; CHAPTER 2: ATOMS, IONS, AND THEIR ELECTRONIC STRUCTURE; 2.1 ATOMS, IONS, AND MATTER; 2.1.1 Atomic Structure; 2.1.2 Electronic Structure; 2.1.2.1 Quantum Numbers; 2.1.2.2 Stationary-State Notation; 2.1.2.3 Stationary-State Transition Notation |
2.1.2.4 Stationary States 2.1.2.5 Spin Orbit Splitting; 2.2 SUMMARY; CHAPTER 3: XPS INSTRUMENTATION; 3.1 PREREQUISITES OF X-RAY PHOTOELECTRON SPECTROSCOPY (XPS); 3.1.1 Vacuum; 3.1.1.1 Vacuum Systems; 3.1.2 X-ray Sources; 3.1.2.1 Standard Sources; 3.1.2.2 Monochromated Sources; 3.1.2.3 Gas Discharge Lamps; 3.1.2.4 Synchrotron Sources; 3.1.3 Electron Sources; 3.1.3.1 Thermionic Sources; 3.1.4 Ion Sources; 3.1.4.1 EI Sources; 3.1.5 Energy Analyzers; 3.1.5.1 CMA; 3.1.5.2 CHA; 3.1.5.3 Modes of Operation; 3.1.5.4 Energy |
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Resolution; 3.1.6 Detectors; 3.1.6.1 EMs; 3.1.7 Imaging; 3.1.7.1 Serial Imaging |
3.1.7.2 Parallel Imaging 3.1.7.3 Spatial Resolution; 3.2 SUMMARY; CHAPTER 4: DATA COLLECTION AND QUANTIFICATION; 4.1 ANALYSIS PROCEDURES; 4.1.1 Sample Handling; 4.1.2 Data Collection; 4.1.3 Energy Referencing; 4.1.4 Charge Compensation; 4.1.5 X-ray and Electron-Induced Damage; 4.2 PHOTOELECTRON INTENSITIES; 4.2.1 Photoelectron Cross Sections; 4.2.2 The Analyzed Volume; 4.2.2.1 Electron Path Lengths; 4.2.2.2 Takeoff Angle; 4.2.3 The Background Signal; 4.2.4 Quantification; 4.3 INFORMATION AS A FUNCTION OF DEPTH; 4.3.1 Opening up the Third Dimension; 4.3.1.1 AR-XPS and Energy-Resolved XPS |
4.3.1.2 Sputter Depth Profiling 4.4 SUMMARY; CHAPTER 5: SPECTRAL INTERPRETATION; 5.1 SPECIATION; 5.1.1 Photoelectron Binding Energies; 5.1.1.1 The Z + 1 Approximation; 5.1.1.2 Initial State Effects; 5.1.1.3 Final State Effects; 5.1.1.4 The Auger Parameter; 5.1.1.5 Curve Fitting; 5.2 SUMMARY; CHAPTER 6: SOME CASE STUDIES; 6.1 OVERVIEW; 6.1.1 Iodine Impregnation of Single-Walled Carbon Nanotube (SWNT); 6.1.2 Analysis of Group IIA-IV Metal Oxides; 6.1.3 Analysis of Mixed Metal Oxides of Interest as SOFC Cathodes; 6.1.4 Analysis of YBCO and Related Oxides/Carbonates; 6.2 SUMMARY; APPENDICES |
APPENDIX A: PERIODIC TABLE OF THE ELEMENTS APPENDIX B: BINDING ENERGIES (B.E.XPS ORB.E.XRF) OF THE ELEMENTS; B.1 1S-3S, 2P-3P, AND 3D VALUES; B.2 4S-5S, 4P-5P, AND 4D VALUES; APPENDIX C: SOME QUANTUM MECHANICS CALCULATIONS OF INTEREST; APPENDIX D: SOME STATISTICAL DISTRIBUTIONS OF INTEREST; D.1 GAUSSIAN DISTRIBUTION; D.2 POISSON DISTRIBUTION; D.3 LORENTZIAN DISTRIBUTIONS; APPENDIX E: SOME OPTICAL PROPERTIES OF INTEREST; E.1 CHROMATIC ABERRATIONS; E.2 SPHERICAL ABERRATIONS; E.3 DIFFRACTION LIMIT; APPENDIX F: SOME OTHER SPECTROSCOPIC/SPECTROMETRIC TECHNIQUES OF INTEREST |
F.1 PHOTON SPECTROSCOPIES |
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Sommario/riassunto |
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"This book introduces readers interested in the field of X-ray Photoelectron Spectroscopy (XPS) to the practical concepts in this field. The book first introduces the reader to the language and concepts used in this field and then demonstrates how these concepts are applied. Including how the spectra are produced, factors that can influence the spectra (all initial and final state effects are discussed), how to derive speciation, volume analysed and how one controls this (includes depth profiling), and quantification along with background substraction and curve fitting methodologies. This is presented in a concise yet comprehensive manner and each section is prepared such that they can be read independently of each other, and all equations are presented using the most commonly used units. Greater emphasis has been placed on spectral understanding/interpretation. For completeness sake, a description of commonly used instrumentation is also presented. Finally, some complementary surface analytical techniques and associated concepts are reviewed for comparative purposes in stand-alone appendix sections"-- |
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