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1. |
Record Nr. |
UNINA9910132766803321 |
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Titolo |
Stata Journal |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Periodico |
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2. |
Record Nr. |
UNINA9911006668003321 |
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Titolo |
Handbook of contamination control in microelectronics : principles, applications, and technology / / edited by Donald L. Tolliver |
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Pubbl/distr/stampa |
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Park Ridge, N.J., U.S.A., : Noyes Publications, c1988 |
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ISBN |
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1-282-00261-9 |
9786612002618 |
0-8155-1745-9 |
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Descrizione fisica |
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1 online resource (510 p.) |
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Collana |
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Materials science and process technology series |
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Altri autori (Persone) |
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Disciplina |
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Soggetti |
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Integrated circuits - Design and construction |
Contamination (Technology) |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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Nota di bibliografia |
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Includes bibliographies and index. |
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Sommario/riassunto |
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This second edition, edited by the world-renowned Dr. Rointain Bunshah, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. Considerably more material was added in Plasma Assisted Vapor Deposition processes, as well as Metallurgical Coating Applications. |
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