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Record Nr. |
UNICAMPANIAVAN00219614 |
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Autore |
Wang, Guilei |
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Titolo |
Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond : Doctoral Thesis accepted by Chinese Academy of Sciences, Beijing, China / Guilei Wang |
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Pubbl/distr/stampa |
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Singapore, : Springer, 2019 |
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Titolo uniforme |
Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond |
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Descrizione fisica |
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xvi, 115 p. : ill. ; 24 cm |
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Soggetti |
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00A79 (77-XX) - Physics [MSC 2020] |
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Lingua di pubblicazione |
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Formato |
Materiale a stampa |
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Livello bibliografico |
Monografia |
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